Sensitivity and accuracy of new ellipsometric technique for the characterization of ultrathin films

Andriy Kostruba; Yurij Stetsyshyn; Rostyslav Vlokh; Sofija Mayevska; Bogdan Rachiy; Rostyslav Musiy; Aleksej Zarkov; Aivaras Kareiva

doi:10.6001/chemija.2017.28.4.1

Andriy Kostruba
Yurij Stetsyshyn
Rostyslav Vlokh
Sofija Mayevska
Bogdan Rachiy
Rostyslav Musiy
Aleksej Zarkov
Aivaras Kareiva

DOI: https://doi.org/10.6001/chemija.2017.28.4.1

Keywords: ellipsometry, accuracy, ultrathin films, thickness, refractive index

Abstract

In this study the possibility for the improvement of accuracy of single wavelength measurements organized by multiple angle of incidence (MAI) null ellipsometry technique is shown. The “transparent film on transparent substrate” system in a range of 1.0–20.0 nm film thickness in the low-contrast region on the film-substrate surface was studied. The developed method allows an independent determination of the thickness and refractive index of an ultrathin transparent film under conditions of a strong correlation effect between these parameters.